Name,Type,Internal,Ext. Acad / Gov,Ext. Intl. Acad,Ext. Affilated,External,Notes 4 Point Probe Station,Fabrication,0,0,0,0,0,Customer use only ALD - Cambridge Nano Fiji 200,Fabrication,90,135,180,135,180,Rates are per run Amerimade Bench BOE/HF,Fabrication,24,36,48,36,48,$35 charge for bath refills Amerimade Bench SC1/SC2,Fabrication,24,36,48,36,48,$35 surcharge per use Asher - Anatech Barrel SCE600,Fabrication,44,66,88,66,88, Asher - Tepla M4L,Fabrication,44,66,88,66,88, Brookhaven ZetaPlus,Characterization,35,52.5,70,127.5,170, Bruker Optical Profilometer,Characterization,24,36,48,37.5,50, Cameca SX Five FE EPMA,Characterization,50,75,100,150,200, Colloidal Dynamics Acoustosizer IIs,Characterization,35,52.5,70,127.5,170, Coulter LS13320,Characterization,35,52.5,70,127.5,170, Coulter Multisizer III,Characterization,35,52.5,70,127.5,170, Critical Point Dryer,Fabrication,60,90,120,90,120,Rates are per run. $20 surcharge per use Dicing Saws- ADT,Fabrication,40,60,80,60,80, "DRIE - Deep RIE, STS",Fabrication,48,72,96,72,96, DRIE - Oxford Plasma Pro,Fabrication,48,72,96,72,96, "E-beam evaporator, PVD",Fabrication,48,72,96,72,96, "Electronic Measurement, Lakeshore 7507",Fabrication,20,30,40,30,40, "Ellipsometer, J.A. Woolam",Characterization,20,30,40,30,40, FEI Helios NanoLab 600 dual beam FIB/SEM,Characterization,65,97.5,130,187.5,250, Flexus 2320,Fabrication,20,30,40,30,40, FTIR/FT-Raman/FTIR Microscope - Thermo Electron Magna 760,Characterization,50,75,100,150,200, "Furnace Tube, Thermcraft, General Hot Process",Fabrication,20,30,40,30,40, "Furnace Tube, Tystar #1 Wet and dry Ox",Fabrication,24,36,48,36,48,Staff run only General Acids/Bases Bench-Left,Fabrication,24,36,48,36,48, General Acids/Bases Bench-Right,Fabrication,24,36,48,36,48, Heidelberg Laser Writer,Fabrication,48,72,96,72,96, Horiba microRaman,Characterization,44,66,88,150,200, JCPDS,Characterization,0,5,10,37.5,50, JEOL Superprobe 733,Characterization,50,75,100,150,200, JST Wet Bench,Fabrication,24,36,48,36,48, "K&S 4124 Ball Bonder, Gold Ball",Fabrication,32,48,64,48,64, K&S 4700 Wedge Bonder (Staff Run),Fabrication,32,48,64,48,64, Labconco Freeze Dryer,Characterization,10,15,20,15,20,Rates are per use. A $10 daily surcharge applies Litho Process EVG Model 620 w/BSA,Fabrication,44,66,88,66,88, Litho Process Headway E-Beam Bay & Hot Plate/Oven,Fabrication,32,48,64,48,64, Litho Process Karl Suss MA6,Fabrication,44,66,88,66,88, Litho Process Laurell Litho Bay & Hot Plate/Oven,Fabrication,32,48,64,48,64, Litho Process Laurell Spinner E-Beam Bay & Hot Plate/Oven,Fabrication,32,48,64,48,64, Litho Process Suss Delta 80 & Hot Plate/Oven,Fabrication,44,66,88,66,88, Logitech PM5 Polisher,Fabrication,0,0,0,0,0,Customer use only Mettler Toledo TGA,Characterization,15,22.5,30,75,100,Staff run only Micro Manipulator,Characterization,5,7.5,10,41.25,55, Microtrac Nanotrac,Characterization,35,52.5,70,127.5,170, Nano-CT - GE v|tome|x m 240,Characterization,35,52.5,70,120,160,"Rates are for first 3 hours. Additional hours for
each rate class are: $10/hr, $15/hr, $20/hr, $30/hr, and $40/hr" Nano-CT Image Processing/Reconstruction System,Characterization,7.5,11.25,22.5,37.5,50, Nikon LV100 Microscope,Fabrication,0,0,0,0,0,Customer use only Objet 3D Printer,Fabrication,0,0,0,0,0,Service work only Optical Microscope - Olympus BX60 with SPOT Insight Digital Camera,Characterization,0,10,20,37.5,50, "Oven, YES, Image Reversal/HMDS",Fabrication,16,24,32,24,32, Paar Physica Electro Kinetic Analyzer,Characterization,25,67.5,90,127.5,170, Panalytical XPert MRD,Characterization,50,75,100,150,200, Panalytical XPert Powder,Characterization,50,75,100,150,200, PECVD - STS 310PC SiO2 - SiN - Amorphous Si,Fabrication,48,72,96,72,96, PECVD - Unaxis 790 PECVD,Unknown,48,72,96,72,96, Perkin-Elmer PHI 660 - AES,Characterization,45,67.5,90,150,200, "Photospectrometer, Filmetrics F40",Fabrication,20,30,40,30,40, "Profilometer, Dektak 150",Fabrication,44,66,88,66,88, "Profilometer, Tencor AS500",Characterization,20,30,40,30,40, Quantachrome PoreMaster Mercury Porosimeter,Characterization,50,75,100,127.5,170, Quantachrome Porometer 3g zh,Characterization,35,52.5,70,45,60, Quantachrome Ultrapyc 1000 Gas Pycnometer,Characterization,35,52.5,70,45,60, "Raith 150, e-beam lithography",Fabrication,24,36,48,36,48,Staff run only Raith ionLiNE - multi-species FIB,Fabrication,40,60,80,60,80,Staff run only Rheometer - ARES LS1,Characterization,10,15,20,45,60, "RIE/ICP, Unaxis SLR",Fabrication,48,72,96,72,96, "RTA, SSI Solaris 150",Fabrication,44,66,88,66,88, "RTA, Steag 100CS RTP",Fabrication,44,66,88,66,88, SCS Parylene Coater,Fabrication,25,37.5,50,37.5,50,Rates are per run SEM - FEI Nova 430 w/EDS & CL,Characterization,60,90,120,150,200, SEM - Hitachi S-3000 VP,Characterization,50,75,100,112.5,150, SEM - JEOL 5700,Fabrication,44,66,88,66,88, SEM - Tescan MIRA3,Characterization,60,90,120,150,200, Solvent Bench #1 Lift Off,Fabrication,0,0,0,0,0, Solvent Bench #1 PR Strip,Fabrication,0,0,0,0,0, Solvent Bench 2 - hot plate and workspace,Fabrication,0,0,0,0,0, Spin Dryer - Sitek,Unknown,0,0,0,0,0, SPM/AFM Dimension 3100,Characterization,40,60,80,112.5,150, "Sputter Deposition, KJL CMS-18 Multi-Source",Fabrication,48,72,96,72,96, TEM - Aberration Corrected S/TEM JEM-ARM200cF (NHMFL - FSU),Characterization,0,0,0,0,0,Service work only TEM - FEI Tecnai F20 S/TEM,Characterization,70,105,140,187.5,250, TEM - JEOL 2010F S/TEM,Characterization,70,105,140,187.5,250, Trion RIE/ICP,Fabrication,48,72,96,72,96, TSI PSD 3603 (Aerosizer),Characterization,35,52.5,70,127.5,170, Unaxis 790 RIE,Fabrication,48,72,96,72,96, "Wafer Bonder, EVG 501",Fabrication,32,48,64,48,64, Wenesco Hotplate,Fabrication,0,0,0,0,0, XPS - Perkin Elmer 5100 XPS System,Characterization,45,67.5,90,150,200, XPS - ULVAC-PHI XPS,Characterization,60,90,120,187.5,250, Zeta Reader Mark 21,Characterization,35,52.5,70,127.5,170,