Raith ionLiNE - multi-species FIB - Status: No Longer Available
  • Current Status: No Longer Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $60.00/Hour
    • External Affiliated Commercial/Industrial: $60.00/Hour
    • External Commercial/Industrial: $80.00/Hour
    • External International Academic: $80.00/Hour
    • Internal Standard: $40.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour
  • Building: NANO (0070)
  • Room: Dual-Beam Fib (132)
  • In Cleanroom: No
  • Main Contact: Brent Gila
 The Raith ionLiNE is a focused ion beam (FIB) lithography system with an alloy ion source. It can process samples up to 4" diameter.

Ion Beam Lithography wiki link
Focused Ion Beam wiki link
Microfabrication wiki link


This is a staff run only resource.Latest Status Log EntryJan 15, 2019 - User Note: Turning instrument down for room survey.
Capabilities Training Prerequisites Calendar Contacts Docs

The Raith ionLiNE is a focused ion beam (FIB) lithography system with a Liquid Metal Alloy Ion Source (LMAIS)rather than traditional Ga for exposure, milling, and implantation.

Capabilities include:
- up to a 4" sample size
- nanometer stage control and accuracy
- 15-40kV column acceleration
- Gas Injection (GIS) with precursors for PT, W, C, XeF2, H2O
- GDSII editor

Currently loaded LMAIS: AuSi

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