Raith ionLiNE - multi-species FIB - Status: Down
||The Raith ionLiNE is a focused ion beam (FIB) lithography system with an alloy ion source. It can process samples up to 4" diameter.
Ion Beam Lithography wiki link
Focused Ion Beam wiki link
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This is a staff run only resource.Latest Status Log EntrySep 8, 2017 - User Note: Shutting down for hurricane Irma
The Raith ionLiNE is a focused ion beam (FIB) lithography system with a Liquid Metal Alloy Ion Source (LMAIS)rather than traditional Ga for exposure, milling, and implantation.
- up to a 4" sample size
- nanometer stage control and accuracy
- 15-40kV column acceleration
- Gas Injection (GIS) with precursors for PT, W, C, XeF2, H2O
- GDSII editor
Currently loaded LMAIS: AuSi