Raith ionLiNE - multi-species FIB - Status: No Longer Available
||The Raith ionLiNE is a focused ion beam (FIB) lithography system with an alloy ion source. It can process samples up to 4" diameter.
Ion Beam Lithography wiki link
Focused Ion Beam wiki link
Microfabrication wiki link
This is a staff run only resource.Latest Status Log EntryJan 15, 2019 - User Note: Turning instrument down for room survey.
The Raith ionLiNE is a focused ion beam (FIB) lithography system with a Liquid Metal Alloy Ion Source (LMAIS)rather than traditional Ga for exposure, milling, and implantation.
- up to a 4" sample size
- nanometer stage control and accuracy
- 15-40kV column acceleration
- Gas Injection (GIS) with precursors for PT, W, C, XeF2, H2O
- GDSII editor
Currently loaded LMAIS: AuSi
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