Sputter Deposition, AJA - Status: Down

AJA Multi-Source RF and DC Sputter System

Sputter Deposition wiki link
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Latest Status Log EntryDec 23, 2020 - Resource Status Down - down

Key Features: Combinatorial Materials Science thin film sputtering system. 3 gas injected Magnetron sputter sources, DC, RF and load lock module. Gases available: Argon, O2 and N2

Substrate Platen: heating to 474 Deg C, sample rotation up to 15 rpm, up to 6 inch substrates, RF or DC bias sputter magnetic or nonmagnetic materials, reactive sputtering

Operation: This tool is Staff Run Only.