Unaxis 790 RIE - Status: Available

  • Current Status: Available
  • Use Rates:
    • External Academic & Government: $72.00/Hour
    • External Affiliated Commercial/Industrial: $72.00/Hour
    • External Commercial/Industrial: $96.00/Hour
    • External International Academic: $96.00/Hour
    • Internal Standard: $48.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour
  • Building: NANO (0070)
  • Room: Cleanroom, Bio/Nano Bio Processing (163)
  • In Cleanroom: Yes
  • Main Contact: rscinfo@mail.ufl.edu
Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials. Features: -Process Gases Available: CHF3, CF4, O2, He. -Substrates up to 8" diameter -Temperature controlled chamber -500W RIE -Manual wafer load.

Reactive-Ion Etching wiki link
Plasma Etching wiki link
Microfabrication wiki link
Latest Status Log EntrySep 13, 2017 - Resource Status Up - tool is now up

Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials. Features: -Process Gases Available: CHF3, CF4, O2, He. -Substrates up to 8" diameter -Temperature controlled chamber -500W RIE -Manual wafer load.