Unaxis 790 RIE - Status: Available

Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials. Features: -Process Gases Available: CHF3, CF4, O2, He. -Substrates up to 8" diameter -Temperature controlled chamber -500W RIE -Manual wafer load.

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Latest Status Log EntryApr 26, 2021 - User Note: added oil

Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials. Features: -Process Gases Available: CHF3, CF4, O2, He. -Substrates up to 8" diameter -Temperature controlled chamber -500W RIE -Manual wafer load.