RIE - Unaxis 790 RIE - Status: Available

Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials. Features: -Process Gases Available: CHF3, CF4, O2, He. -Substrates up to 8" diameter -Temperature controlled chamber -500W RIE -Manual wafer load.

Reactive-Ion Etching wiki link
Plasma Etching wiki link
Microfabrication wiki link
Latest Status Log EntryMar 23, 2023 - User Note: train. adj atm switch

Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials. Features: -Process Gases Available: CHF3, CF4, O2, He. -Substrates up to 8" diameter -Temperature controlled chamber -500W RIE -Manual wafer load.

An active Gatorlink login is required to create a new reservation.