RIE - Unaxis 790 RIE - Status: Available
||Description: Unaxis 790 Reactive Ion Etcher. Etch Capabilities: SiO2, Si3N4, photoresist, polyimide, dielectrics and other commonly used materials.
-Process Gases Available: CHF3, CF4, O2, He.
-Substrates up to 8" diameter
-Temperature controlled chamber
-Manual wafer load.
Reactive-Ion Etching wiki link
Plasma Etching wiki link
Microfabrication wiki link
Latest Status Log EntryMay 31, 2023 - User Note: added oil
To select the time for your reservation, click on the calendar at the desired start time and drag to the desired end time. If you are logged in, the reservations will display the names of the reservation users. Note: If the calendar is down, the following link may also be used to create a reservation: Create Reservation (Quick Form)
Please Note: This tool enforces a 30 minute buffer between reservations. This allows time for staff to prep the tool.
An active Gatorlink login is required to create a new reservation.