PECVD - Unaxis 790 PECVD - Status: Down

  • Current Status: Down
  • Use Rates:
    • External Academic & Government: $72.00/Hour
    • External Affiliated Commercial/Industrial: $72.00/Hour
    • External Commercial/Industrial: $96.00/Hour
    • External International Academic: $96.00/Hour
    • Internal Standard: $48.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Bill Lewis
Unaxis 790 PECVD - Plasma Enhanced Chemical Vapor Deposition System.

PECVD wiki link
Microfabrication wiki link
Latest Status Log EntryMay 18, 2018 - Resource Status Down - down for standard SiO2, and SiN processing. UP for non std recipes only by request to RSC Staff.

Deposition Capabilities: SiO2, SiN, SiC. The system is equipped with one 13.56 MHz 500 Watt RF power supply. Process Gases Available: 5%SiH4/He, N2O, NH3, N2, He, SF6, CH4. The system is capable of processing samples up to 8” diameter.