PECVD - Unaxis 790 PECVD - Status: Down
||Unaxis 790 PECVD - Plasma Enhanced Chemical Vapor Deposition System.
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Latest Status Log EntryMay 18, 2018 - Resource Status Down - down for standard SiO2, and SiN processing. UP for non std recipes only by request to RSC Staff.
Deposition Capabilities: SiO2, SiN, SiC. The system is equipped with one 13.56 MHz 500 Watt RF power supply. Process Gases Available: 5%SiH4/He, N2O, NH3, N2, He, SF6, CH4. The system is capable of processing samples up to 8” diameter.