FIB - FEI Helios G4 PFIB CXe dual beam FIB/SEM - Status: In Use

  • Current Status: In Use
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $97.50/Hour
    • External Affiliated Commercial/Industrial: $187.50/Hour
    • External Commercial/Industrial: $250.00/Hour
    • External International Academic: $130.00/Hour
    • Internal Standard: $50.00/Hour
  • Building: NANO (0070)
  • Room: Dual-Beam Fib (132)
  • Room Max Occupancy: 1
  • In Cleanroom: No
  • Main Contact: rscinfo@mail.ufl.edu
*ANALYSIS OF RADIOACTIVE SPECIMENS WITH THIS INSTRUMENT IS STRICTLY PROHIBITED*

The FEI Helios G4 PFIB CXe DualBeam system integrates focused ion and scanning electron beams for FIB and SEM functionality in one instrument.

Instrument Specifications:

  • Schottky field emission gun Elstar UC+ SEM column; 0.3 - 30 kV operating voltage with <0.1 nm resolution
  • Xe plasma source FIB
  • Plasma FIB 2.0 column with 2 - 30 kV operating voltage
  • In-situ Pt deposition
  • In-situ C deposition
  • EasyLift in-situ micromanipulator
  • EDAX Octane Elite (70 mm squared active area) SDD EDS
  • EDAX Velocity EBSD camera
  • EDAX OIM 8 Analysis software

  • Latest Status Log EntryFeb 19, 2021 - Resource Status Up - System ready for use

  • Nanoscale compositional analysis using EDS
  • Texture and crystallographic analysis using EBSD