Raith 150, e-beam lithography - Status: Available
||The RAITH150 is a multipurpose tool capable of direct e-beam exposure, wafer scale process development at suboptical resolution. The system includes integrated linewidth and metrology functions which give the user the ability to optimize process reproducibility. In addition the SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.
Electron Beam Lithography wiki link
Photoresist wiki link
E-beam resist wiki link
Microfabrication wiki link
This is a staff run only resource. Latest Status Log EntryMay 11, 2023 - Resource Status Up - Mechanical pump replaced with provisional one. Waiting for quote on original pump replacement. Please let us know if you have any issues.
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