Raith 150, e-beam lithography - Status: Available
  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $46.50/Hour
    • External Affiliated Commercial/Industrial: $46.50/Hour
    • External Commercial/Industrial: $62.00/Hour
    • External International Academic: $62.00/Hour
    • Internal Standard: $31.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, E Beam (161)
  • In Cleanroom: Yes
  • Main Contact: Andres Trucco
 The RAITH150 is a multipurpose tool capable of direct e-beam exposure, wafer scale process development at suboptical resolution. The system includes integrated linewidth and metrology functions which give the user the ability to optimize process reproducibility. In addition the SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.

Electron Beam Lithography wiki link
Photoresist wiki link
E-beam resist wiki link
Microfabrication wiki link


This is a staff run only resource. Latest Status Log EntryJan 2, 2024 - Resource Status Up - Ready for use
Capabilities Training Prerequisites Calendar Contacts Docs

Use Prerequisites

PrerequisiteDescriptionStatus
Computer AccessRequires computer access be setupCheck Your Status
Funding SourceRequires permission to an active funding sourceCheck Your Status
Work PlanRequires a work plan be approved by PI and staffCheck Your Status
Agreement FormRequires completed agreement form for equipment usageCheck Your Status
RSC Safety TrainingRequires completion of safety trainingCheck Your Status
NRF Building AccessRequires issue of an id badge and entry badge and/or access level to be set.Check Your Status
Equipment TrainingRequires completion of equipment trainingCheck Your Status

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