Raith 150, e-beam lithography - Status: Available
||The RAITH150 is a multipurpose tool capable of direct e-beam exposure, wafer scale process development at suboptical resolution. The system includes integrated linewidth and metrology functions which give the user the ability to optimize process reproducibility. In addition the SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.
Electron Beam Lithography wiki link
Photoresist wiki link
E-beam resist wiki link
Microfabrication wiki link
This is a staff run only resource. Latest Status Log EntryMay 11, 2023 - Resource Status Up - Mechanical pump replaced with provisional one. Waiting for quote on original pump replacement. Please let us know if you have any issues.
|Computer Access||Requires computer access be setup||Check Your Status|
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|Work Plan||Requires a work plan be approved by PI and staff||Check Your Status|
|Agreement Form||Requires completed agreement form for equipment usage||Check Your Status|
|RSC Safety Training||Requires completion of safety training||Check Your Status|
|NRF Building Access||Requires issue of an id badge and entry badge and/or access level to be set.||Check Your Status|
|Equipment Training||Requires completion of equipment training||Check Your Status|
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