Raith 150, e-beam lithography - Status: Available

  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $46.50/Hour
    • External Affiliated Commercial/Industrial: $46.50/Hour
    • External Commercial/Industrial: $62.00/Hour
    • External International Academic: $62.00/Hour
    • Internal Standard: $31.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, E Beam (161)
  • In Cleanroom: Yes
  • Main Contact: Andres Trucco
The RAITH150 is a multipurpose tool capable of direct e-beam exposure, wafer scale process development at suboptical resolution. The system includes integrated linewidth and metrology functions which give the user the ability to optimize process reproducibility. In addition the SEM side can be used to obtain large high magnification tiled images by taking advantage of the high resolution interferometer stage.

Electron Beam Lithography wiki link
Photoresist wiki link
E-beam resist wiki link
Microfabrication wiki link


This is a staff run only resource. Latest Status Log EntryMay 23, 2024 - Resource Status Up - for file transfer for user.
Contact LevelNameEmail
1Trucco, Andresandres5@ufl.edu
2Lewis, Billwalewis@ufl.edu
3Gila, Brentbgila@ufl.edu

General Contact: rscinfo@mail.ufl.edu

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