Sputter Deposition, KJL CMS-18 Multi-Source - Status: In Use

  • Current Status: In Use
  • Use Rates:
    • External Academic & Government: $72.00/Hour
    • External Affiliated Commercial/Industrial: $72.00/Hour
    • External Commercial/Industrial: $96.00/Hour
    • External International Academic: $96.00/Hour
    • Internal Standard: $48.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Bill Lewis
Kurt J. Lesker Multi-Source RF and DC Sputter System.

Sputter Deposition wiki link
Microfabrication wiki link
Latest Status Log EntryNov 17, 2017 - Resource Status Up - reseated cryo sensor. back up.

Key Features: Combinatorial Materials Science thin film sputtering system 4 gas injected Magnetron sputter sources, DC, RF and Pulsed DC load lock module with rack-and-pinion transfer Substrate Platen: heating to 550 Deg C for 4" wafer, 360 Deg C for sample holder mounted substrate, rotation up to 40 rpm, up to 6” substrates, RF or DC bias sputter magnetic or nonmagnetic materials, reactive sputtering Operation: Manual or full Auto via process control process recipe Software---Windows-based, I/O subsystem, automatic process controller with GUI Unlimited user recipe management Gases available: Argon, O2 and N2


RESERVATION POLICIES:
EMAIL OR CALL STAFF IF YOU MAKE A RESERVATION LESS THAN 4 BUSINESS HOURS AWAY OR IT MAY NOT GET LOADED. NEXT DAY RESERVATIONS MADE AFTER 3PM WILL NOT BE LOADED UNTIL 10AM THE NEXT MORNING
REACTIVE RECIPE TARGETS REQUIRE A ONE DAY ADVANCED RESERVATION SCHEDULED FOR 8AM.
DON'T FORGET TO CANCEL YOUR RESERVATION IF YOUR TARGET DOES NOT GET LOADED OR YOU WILL INCUR A RESOURCE TRANSACTION CHARGE.

Sputter Consumables Surcharge

Available Sputter Targets: - User Owned Target, Ag, Al, Al / 2% Si, Al2O3 Reactive - 1 day advance reservation, Au, Bi2O3, Cr, Cr2O3 Reactive - 1 day advance reservation, Cu, Ge, Hf, HfO, In2O3, InGaZnO, InO/ZnO, Ir, ITO, Mo, Ni, Pd, Pt, Ru, Si - undoped, SIO2, SiO2 Reactive - 1 day advance reservation, Ta, TaN, Ti, TiB2, TiN, TiO2, TiO2 Reactive - 1 day advance reservation, W, W2B, Y2O3, ZnO, ZnO-Al2O3(98/2%), Zr, ZrB2, ZrN