Sputter Deposition, KJL CMS-18 Multi-Source - Status: In Use

Kurt J. Lesker Multi-Source RF and DC Sputter System.

Sputter Deposition wiki link
Microfabrication wiki link
Latest Status Log EntryMar 3, 2021 - User Note: targets...Mo, Ti, Au, Pt

Key Features: Combinatorial Materials Science thin film sputtering system 4 gas injected Magnetron sputter sources, DC, RF and load lock module with rack-and-pinion transfer Substrate Platen: heating to 550 Deg C for 4" wafer, 360 Deg C for sample holder mounted substrate, rotation up to 40 rpm, up to 6” substrates, RF or DC bias sputter magnetic or nonmagnetic materials, reactive sputtering Operation: Manual or full Auto via process control process recipe Software---Windows-based, I/O subsystem, automatic process controller with GUI Unlimited user recipe management Gases available: Argon, O2 and N2

RESERVATION POLICY:

Reservations must be made at least 4 hours in advance. Call or text Staff directly on cell phone if you need to make a same day reservation to see if it can be accommodated. Next day reservations made after 3PM may not be loaded until 10AM the next day.
If your target does not get loaded, cancel/change your reservation and email RSC Staff to avoid missed reservation fee.

REACTIVE SPUTTER RESERVATION POLICY:

Reactive sputter reservations require 2 steps:
Step 1 – Use the Project "ZZ - Sputter Placeholder Reservations" to reserve the tool from 4:00-4:15PM the day before your actual sputter reservation so that the targets may be loaded for overnight pumpdown. Add the comment “Placeholder Reservation” in the comment field. If 4PM is not available, use a time as close as possible to that time.
Step 2 – Reserve the tool between 8AM and 9AM the next calendar day.

Sputter Consumables Surcharge

Available Sputter Targets: - User Owned Target, Ag, Al, Al / 2% Si, Al2O3 Reactive - 1 day advance reservation, Au, Bi2O3, Cr, Cr2O3 Reactive - 1 day advance reservation, Cu, Ge, Hf, HfO, In2O3, InGaZnO, InO/ZnO, Ir, ITO, Mo, Ni, Pd, Pt, Ru, Si - undoped, SIO2, SiO2 Reactive - 1 day advance reservation, Ta, TaN, Ti, TiB2, TiN, TiO2, TiO2 Reactive - 1 day advance reservation, W, W2B, Y2O3, ZnO, ZnO-Al2O3(98/2%), Zr, ZrB2, ZrN