Sputter Deposition, KJL CMS-18 Multi-Source - Status: Available
||Kurt J. Lesker Multi-Source RF and DC Sputter System.
Sputter Deposition wiki link
Microfabrication wiki link
Latest Status Log EntryMar 24, 2020 - User Note: regened cryo and pumped back down. shut all valves uder vac. shutown computer, rack on, rotary pump on.
Combinatorial Materials Science thin film sputtering system
4 gas injected Magnetron sputter sources, DC, RF and load lock module with rack-and-pinion transfer
Substrate Platen: heating to 550 Deg C for 4" wafer, 360 Deg C for sample holder mounted substrate, rotation up to 40 rpm, up to 6” substrates, RF or DC bias
sputter magnetic or nonmagnetic materials, reactive sputtering
Operation: Manual or full Auto via process control process recipe
Software---Windows-based, I/O subsystem, automatic process controller with GUI
Unlimited user recipe management
Gases available: Argon, O2 and N2
Reservations must be made at least 4 hours in advance. Email or call Staff directly if you need to make a same day reservation to see if it can be accommodated. Next day reservations made after 3PM may not be loaded until 10AM the next day.
If your target does not get loaded, cancel/change your reservation and email RSC Staff to avoid missed reservation fee.
REACTIVE SPUTTER RESERVATION POLICY:
Reactive sputter reservations require 2 steps:
Step 1 – Reserve the tool for 4PM the day before your actual sputter reservation so that the targets may be loaded for overnight pumpdown. Add the comment “Placeholder Reservation” in the comment field.
Step 2 – Reserve the tool between 7AM and 9AM the next calendar day.
Sputter Consumables Surcharge
Available Sputter Targets: - User Owned Target, Ag, Al, Al / 2% Si, Al2O3 Reactive - 1 day advance reservation, Au, Bi2O3, Cr, Cr2O3 Reactive - 1 day advance reservation, Cu, Ge, Hf, HfO, In2O3, InGaZnO, InO/ZnO, Ir, ITO, Mo, Ni, Pd, Pt, Ru, Si - undoped, SIO2, SiO2 Reactive - 1 day advance reservation, Ta, TaN, Ti, TiB2, TiN, TiO2, TiO2 Reactive - 1 day advance reservation, W, W2B, Y2O3, ZnO, ZnO-Al2O3(98/2%), Zr, ZrB2, ZrN