Litho Process Suss Delta 80 & Hot Plate/Oven - Status: Available
  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $68.25/Hour
    • External Affiliated Commercial/Industrial: $68.25/Hour
    • External Commercial/Industrial: $91.00/Hour
    • External International Academic: $91.00/Hour
    • Internal Standard: $45.50/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Photolithography (165)
  • In Cleanroom: Yes
  • Main Contact: Bill Lewis
 Description: The Litho Bay Suss Delta 80 Spinner automatically applies AZ1512 and AZ9260 photoresist. It has the unique capability of applying photoresist in a solvent rich environment; improving uniformity and extending the allowable thickness range for a single photoresist type. Other materials may be used ONLY by special request to NRF Staff. Sample sizes: fragments <4", 4" max for round substrates, 4" max for square substrates. Pump 1 resist = AZ 1512 photoresist Pump 2 resist = AZ 9260 photoresist Autosyringe dispense = available for dispensing other materials (email requests to NRF Staff)

The use of photoresist support equipment (not tracked/ charged) is built into the spinner charge rate. Support equipment includes: HMDS hotplate, soft bake hotplates, hard bake hotplates and ovens.

Spin Coating wiki link
Photolithography wiki link
Photoresist wiki link
Microfabrication wiki linkLatest Status Log EntryApr 19, 2024 - User Note: installed new bottle of AZ1512
Capabilities Training Prerequisites Calendar Contacts Docs

Description: The Litho Bay Suss Delta 80 Spinner automatically applies Shipley S1813 and AZ9260 photoresist. It has the unique capability of applying photoresist in a solvent rich environment; improving uniformity and extending the allowable thickness range for a single photoresist type. Other materials may be used ONLY by special request to NRF Staff. Sample sizes: fragments <4", 4" max for round substrates, 4" max for square substrates. Pump 1 resist = Shipley S1813 photoresist Pump 2 resist = AZ 9260 photoresist Autosyringe dispense = available for dispensing other materials (email requests to NRF Staff)

The use of photoresist support equipment (not tracked/ charged) is built into the spinner charge rate. Support equipment includes: HMDS hotplate, soft bake hotplates, hard bake hotplates and ovens.

An active Gatorlink login is required to create a new reservation.