Litho Process Suss Delta 80 & Hot Plate/Oven - Status: Available
||Description: The Litho Bay Suss Delta 80 Spinner automatically applies AZ1512 and AZ9260 photoresist. It has the unique capability of applying photoresist in a solvent rich environment; improving uniformity and extending the allowable thickness range for a single photoresist type. Other materials may be used ONLY by special request to NRF Staff.
Sample sizes: fragments <4", 4" max for round substrates, 4" max for square substrates.
Pump 1 resist = AZ 1512 photoresist
Pump 2 resist = AZ 9260 photoresist
Autosyringe dispense = available for dispensing other materials (email requests to NRF Staff)
The use of photoresist support equipment (not tracked/ charged) is built into the spinner charge rate. Support equipment includes: HMDS hotplate, soft bake hotplates, hard bake hotplates and ovens.
Spin Coating wiki link
Photolithography wiki link
Photoresist wiki link
Microfabrication wiki linkLatest Status Log EntryDec 20, 2022 - User Note: cleaned system, bowls, drain tank etc.
|Liftoff - S1813 Image Reversal||Download|
|Litho Process, Suss Delta 80 & Hot Plate/Oven SOP||Download|
|NRF Lithography Processes SOP||Download|
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