PECVD - STS 310PC SiO2 - SiN - Amorphous Si - Status: Available
||STS 310PC - Plasma Enhanced Chemical Vapor Deposition System.
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Latest Status Log EntryMar 20, 2020 - User Note: chamber clean and condition
Description: The PECVD STS deposition tool is used for depositing silicon nitride, silicon dioxide and amorphous silicon films. The system is equipped with 13.56 MHz and 187.5 kHz frequencies and is capable of mixed frequency recipes. Process Gases Available: SiH4, N2O, NH3, N2, Ar. The temperature of the system is normally kept at 300 °C. Therefore, only the materials that are stable at these temperatures are allowed in the STS deposition system.