PECVD - STS 310PC SiO2 - SiN - Amorphous Si - Status: Available

  • Current Status: Available
  • Use Rates:
    • External Academic & Government: $72.00/Hour
    • External Affiliated Commercial/Industrial: $72.00/Hour
    • External Commercial/Industrial: $96.00/Hour
    • External International Academic: $96.00/Hour
    • Internal Standard: $48.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: David Hays
STS 310PC - Plasma Enhanced Chemical Vapor Deposition System.

PECVD wiki link
Microfabrication wiki link
Latest Status Log EntryOct 27, 2017 - Resource Status Up - down for low temp processing

Description: The PECVD STS deposition tool is used for depositing silicon nitride, silicon dioxide and amorphous silicon films. The system is equipped with 13.56 MHz and 187.5 kHz frequencies and is capable of mixed frequency recipes. The temperature of the system is normally kept at 300 °C. Therefore, only the materials that are stable at these temperatures are allowed in the STS deposition system.