Litho Process EVG Model 620 w/BSA - Status: Available

  • Current Status: Available
  • Use Rates:
    • External Academic & Government: $66.00/Hour
    • External Affiliated Commercial/Industrial: $66.00/Hour
    • External Commercial/Industrial: $88.00/Hour
    • External International Academic: $88.00/Hour
    • Internal Standard: $44.00/Hour
  • Service: Request Service Quote. The Staff rate is $50/hour
  • Building: NANO (0070)
  • Room: Cleanroom, Photolithography (165)
  • In Cleanroom: Yes
  • Main Contact: Al Ogden
The EVG 620 is a double-side mask aligner and it can be used for UV lithography on wafers of sizes up to 150mm.

The lamp is ON

Photolithography wiki link
Photoresist wiki link
Microfabrication wiki linkLatest Status Log EntrySep 13, 2017 - Resource Status Up - Recovered after storm shutdown.

The EVG 620 is a double-side mask aligner and it can be used for UV lithography on wafers of sizes up to 150mm. It has options for soft contact, hard contact and proximity exposure. It has +/- 1 um front-to backside alignment accuracy and also a Bond alignment capability. Advanced notification must be sent before the machine can be used.

The use of the developer station(not tracked/ charged) is built into the charge rate.