Litho Process EVG Model 620 w/BSA - Status: Available
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The EVG 620 is a double-side mask aligner and it can be used for UV lithography on wafers of sizes up to 150mm.
The lamp is OFF (contact Staff if you need to use the tool) Photolithography wiki link Photoresist wiki link Microfabrication wiki linkLatest Status Log EntryApr 12, 2024 - Resource Status Up - up for bonding only |
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Equipment Image | Download |
Litho Process EVG Model 620 w/BSA SOP | Download |
NRF Lithography Processes SOP | Download |
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