Litho Process EVG Model 620 w/BSA - Status: Available
||The EVG 620 is a double-side mask aligner and it can be used for UV lithography on wafers of sizes up to 150mm.
The lamp is OFF (contact Staff if you need to use the tool)
Photolithography wiki link
Photoresist wiki link
Microfabrication wiki linkLatest Status Log EntryMay 23, 2023 - User Note: adjust lamp ci to 20mw
|Computer Access||Requires computer access be setup||Check Your Status|
|Funding Source||Requires permission to an active funding source||Check Your Status|
|Work Plan||Requires a work plan be approved by PI and staff||Check Your Status|
|Agreement Form||Requires completed agreement form for equipment usage||Check Your Status|
|RSC Safety Training||Requires completion of safety training||Check Your Status|
|NRF Building Access||Requires issue of an id badge and entry badge and/or access level to be set.||Check Your Status|
|Equipment Training||Requires completion of equipment training||Check Your Status|
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