ALD - Cambridge Nano Fiji 200 - Status: In Use
  • Current Status: In Use
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $139.50/Run(24h)
    • External Affiliated Commercial/Industrial: $139.50/Run(24h)
    • External Commercial/Industrial: $186.00/Run(24h)
    • External International Academic: $186.00/Run(24h)
    • Internal Standard: $93.00/Run(24h)
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Andres Trucco
 Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.

Atomic Layer Deposition wiki link
Microfabrication wiki link
Plasma-ald and ALD resources
Latest Status Log EntryApr 18, 2024 - User Note: Running 4 calibration runs. All plasma mode 200C HfO2 300 OK ZrO2 300 OK HZO 150 cycles HZO with H2 pulse 150 cycles. all runs on Si substrate.
Capabilities Training Prerequisites Calendar Contacts Docs

Cambridge Nano Fiji 200 - A loadlocked ALD system with thermal and plasma deposition capabilities, 5 metal-organic precursors and up to 8" wafer sample size. The system is capable of operating in "exposure mode" which allows for deposition in high aspect ratio features.

Available Recipes: Al2O3, HfO2, AlN, Pt, Ru, TiN, TiO2, ZrO2 and SiO2.

Charge rate is per ALD run (24hr.) plus the precursor used for that run.
ALD Precursors Surcharge

Current precursors loaded:
0-H2O
1-Hf Valve open
2-Al Valve open
3-Zr Valve open
4-Si Valve open
5-Ti Valve open

NOTE: Precursor changes need to be notified 48h in advance.

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