ALD - Cambridge Nano Fiji 200 - Status: Available

  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $139.50/Run(24h)
    • External Affiliated Commercial/Industrial: $139.50/Run(24h)
    • External Commercial/Industrial: $186.00/Run(24h)
    • External International Academic: $186.00/Run(24h)
    • Internal Standard: $93.00/Run(24h)
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Andres Trucco
Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.

Atomic Layer Deposition wiki link
Microfabrication wiki link
Plasma-ald and ALD resources
Latest Status Log EntryJun 10, 2024 - Resource Status Up - Ready to use. Valves purged and heaters back up. PCW outage.

Cambridge Nano Fiji 200 - A loadlocked ALD system with thermal and plasma deposition capabilities, 5 metal-organic precursors and up to 8" wafer sample size. The system is capable of operating in "exposure mode" which allows for deposition in high aspect ratio features.

Available Recipes: Al2O3, HfO2, AlN, Pt, Ru, TiN, TiO2, ZrO2 and SiO2.

Charge rate is per ALD run (24hr.) plus the precursor used for that run.
ALD Precursors Surcharge

Current precursors loaded:
0-H2O
1-Hf Valve open
2-Al Valve open
3-Zr Valve open
4-Si Valve open
5-Ti Valve open

NOTE: Precursor changes need to be notified 48h in advance.

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