ALD - Cambridge Nano Fiji 200 - Status: Available
||Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.
Atomic Layer Deposition wiki link
Microfabrication wiki link
Plasma-ald and ALD resources
Latest Status Log EntryNov 16, 2023 - User Note: Removed and weight SiO2 precursor. Bottle empty. New precursors on order from two vendors.
To select the time for your reservation, click on the calendar at the desired start time and drag to the desired end time. If you are logged in, the reservations will display the names of the reservation users. Note: If the calendar is down, the following link may also be used to create a reservation: Create Reservation (Quick Form)
Please do not reserve more than 72 hours cumulatively for calendar week. This will allow other ALD members the opportunity to create reservations for tool access.
Please do not use the ALD tool as 'sample storage', remove your samples when your run is complete.
Precursor change request must be made 24h in advance via email.
An active Gatorlink login is required to create a new reservation.