ALD - Cambridge Nano Fiji 200 - Status: Available
  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $139.50/Run(24h)
    • External Affiliated Commercial/Industrial: $139.50/Run(24h)
    • External Commercial/Industrial: $186.00/Run(24h)
    • External International Academic: $186.00/Run(24h)
    • Internal Standard: $93.00/Run(24h)
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Andres Trucco
 Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.

Atomic Layer Deposition wiki link
Microfabrication wiki link
Plasma-ald and ALD resources
Latest Status Log EntryNov 16, 2023 - User Note: Removed and weight SiO2 precursor. Bottle empty. New precursors on order from two vendors.
Capabilities Training Prerequisites Calendar Contacts Docs
Contact LevelNameEmail
1Trucco, Andresandres5@ufl.edu
2Gila, Brentbgila@ufl.edu
3Downing, Marcomadowning@ufl.edu

General Contact: rscinfo@mail.ufl.edu

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