ALD - Cambridge Nano Fiji 200 - Status: Available
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Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.
Atomic Layer Deposition wiki link Microfabrication wiki link Plasma-ald and ALD resources Latest Status Log EntryApr 18, 2024 - User Note: Running 4 calibration runs. All plasma mode 200C HfO2 300 OK ZrO2 300 OK HZO 150 cycles HZO with H2 pulse 150 cycles. all runs on Si substrate. |
Contact Level | Name | |
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1 | Trucco, Andres | andres5@ufl.edu |
2 | Gila, Brent | bgila@ufl.edu |
3 | Downing, Marco | madowning@ufl.edu |
General Contact: rscinfo@mail.ufl.edu
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