ALD - Cambridge Nano Fiji 200 - Status: In Use
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Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.
Atomic Layer Deposition wiki link Microfabrication wiki link Plasma-ald and ALD resources Latest Status Log EntryJun 10, 2024 - Resource Status Up - Ready to use. Valves purged and heaters back up. PCW outage. |
Contact Level | Name | |
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1 | Trucco, Andres | andres5@ufl.edu |
2 | Gila, Brent | bgila@ufl.edu |
3 | Downing, Marco | madowning@ufl.edu |
General Contact: rscinfo@mail.ufl.edu
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