ALD - Cambridge Nano Fiji 200 - Status: In Use
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Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.
Atomic Layer Deposition wiki link Microfabrication wiki link Plasma-ald and ALD resources Latest Status Log EntryApr 18, 2024 - User Note: Running 4 calibration runs. All plasma mode 200C HfO2 300 OK ZrO2 300 OK HZO 150 cycles HZO with H2 pulse 150 cycles. all runs on Si substrate. |
Use Prerequisites
| Prerequisite | Description | Status |
|---|---|---|
| Computer Access | Requires computer access be setup | Check Your Status |
| Funding Source | Requires permission to an active funding source | Check Your Status |
| Work Plan | Requires a work plan be approved by PI and staff | Check Your Status |
| Agreement Form | Requires completed agreement form for equipment usage | Check Your Status |
| RSC Safety Training | Requires completion of safety training | Check Your Status |
| NRF Building Access | Requires issue of an id badge and entry badge and/or access level to be set. | Check Your Status |
| Equipment Training | Requires completion of equipment training | Check Your Status |
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