ALD - Cambridge Nano Fiji 200 - Status: In Use
  • Current Status: In Use
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $139.50/Run(24h)
    • External Affiliated Commercial/Industrial: $139.50/Run(24h)
    • External Commercial/Industrial: $186.00/Run(24h)
    • External International Academic: $186.00/Run(24h)
    • Internal Standard: $93.00/Run(24h)
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Andres Trucco
 Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.

Atomic Layer Deposition wiki link
Microfabrication wiki link
Plasma-ald and ALD resources
Latest Status Log EntryApr 18, 2024 - User Note: Running 4 calibration runs. All plasma mode 200C HfO2 300 OK ZrO2 300 OK HZO 150 cycles HZO with H2 pulse 150 cycles. all runs on Si substrate.
Capabilities Training Prerequisites Calendar Contacts Docs
Title
Al2O3 uniformity dataDownload
Al2O3 Uniformity data after chamber cleanDownload
ALD Operation ProcedureDownload
ALD Precursors SurchargeDownload
AlN uniformityDownload
Equipment ImageDownload

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