ALD - Cambridge Nano Fiji 200 - Status: Available

  • Current Status: Available
  • Training: View Topics/Sessions
  • Use Rates:
    • External Academic & Government: $139.50/Run(24h)
    • External Affiliated Commercial/Industrial: $139.50/Run(24h)
    • External Commercial/Industrial: $186.00/Run(24h)
    • External International Academic: $186.00/Run(24h)
    • Internal Standard: $93.00/Run(24h)
  • Service: Request Service Quote. The Staff rate is $50/hour (Internal) and $55 /hour (External) in addition to the instrument rate.
  • Building: NANO (0070)
  • Room: Cleanroom, Film Deposition (164)
  • In Cleanroom: Yes
  • Main Contact: Andres Trucco
Cambridge Nano Fiji 200 - ALD system with thermal, plasma, and exposure (allows for deposition in high aspect ratio features) deposition capabilities.

Atomic Layer Deposition wiki link
Microfabrication wiki link
Plasma-ald and ALD resources
Latest Status Log EntryNov 16, 2023 - User Note: Removed and weight SiO2 precursor. Bottle empty. New precursors on order from two vendors.
Al2O3 uniformity dataDownload
Al2O3 Uniformity data after chamber cleanDownload
ALD Operation ProcedureDownload
ALD Precursors SurchargeDownload
AlN uniformityDownload
Equipment ImageDownload

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